Accession Number:

ADA256774

Title:

Unique Hydride Chemistry on Silicon - PH3 Interaction with Si(100)-(2x1)

Descriptive Note:

Corporate Author:

CALIFORNIA UNIV DAVIS DEPT OF WATER SCIENCE AND ENGINEERING

Report Date:

1992-09-01

Pagination or Media Count:

26.0

Abstract:

The dissociative adsorption of phosphine PH3 on Si1 00-2x1 and its high temperature thermal behavior have been studied by high-resolution electron energy loss spectroscopy HREELS, Auger electron spectroscopy AES and by temperature programmed desorption TPD. Phosphine adsorbs dissociatively onto Si100-2x1 at 100 K as PH2 and H species, as revealed by vibrational bands at 1050 cm1 Delta sub scPH2 and 2100 cm-1vSi-H. The PH2a undergoes thermal decomposition to adsorbed P and H near 650 K, as determined by HREELS. TPD measurements reveal two PH3 desorption processes at 485 and 635 K. The 635 K-desorption is shown to result from PH2 H recombination, while the mechanism for the 485 K-desorption cannot be definitively identified. Additionally, two H2 desorption states were observed at 685 and 770 K. Comparison of these features with H2 desorption from clean and phosphorus- modified silicon Indicates that the 685- and 770 K-H2 desorption kinetics are controlled by thermal dissociation of adsorbed PHx species which supply hydrogen to the surface.

Subject Categories:

  • Inorganic Chemistry
  • Physical Chemistry

Distribution Statement:

APPROVED FOR PUBLIC RELEASE