A Simple Controller for Repetitive Cycles in Atomic Layer Epitaxy
TEXAS UNIV AT AUSTIN DEPT OF ELECTRICAL AND COMPUTER ENGINEERING
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A simple controller system has been designed and added to an existing deposition system in order to implement deposition of silicon by Atomic Layer Epitaxy ALE. A Remote Plasma-enhanced Chemical Vapor Deposition RPCVD system has been modified for automatic control of repetitive cycles of disilane dosing and hydrogen desorption via low energy ion bombardment. The simple configuration of the inputoutput modules and ease of programming allowed efficient debugging of the installation and a large degree of flexibility in in situ cleaning and in both ALE and CVD experiments.
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