Accession Number:

ADA255241

Title:

Spectroscopy and Reactions of Hydrazoic Acid on Silicon Single Crystal Surfaces (III). HN3 and DN3 on SI(111)-7x7

Descriptive Note:

Corporate Author:

EMORY UNIV ATLANTA GA DEPT OF CHEMISTRY

Personal Author(s):

Report Date:

1992-01-01

Pagination or Media Count:

32.0

Abstract:

We have studied the thermal stability and spectroscopy of HN3 on Si111-7x7 in the temperature range from 120 to 1350 K. The results are similar to those observed on other two low-index Si surfaces. HN3 was found to molecularly adsorb on Si111-7x7 at 120 K, with the formation of dimers at higher dosages less then or equal to 2.0 L. At 270 K, HN3 began to decompose into HN and N2 species as indicated by the changes in the NH vibration mode in HREELS and the chemical shift of N 1s XPS peak. Between 300 and 800 K, the NH species further decomposed into H and N on the surface, while N2 desorbed molecularly. In this temperature range, the steady increase of the SiNx and Si-H peaks were noted and LEED exhibited a weak 1x1 pattern.

Subject Categories:

  • Inorganic Chemistry
  • Physical Chemistry
  • Crystallography
  • Atomic and Molecular Physics and Spectroscopy

Distribution Statement:

APPROVED FOR PUBLIC RELEASE