Accession Number:

ADA254756

Title:

Soft X-Ray Projection Lithography Topical Meeting Held in Monterey, California on April 6 - 8, 1992. Technical Digest, Volume 8

Descriptive Note:

Quarterly rept. 6-8 Apr 92,

Corporate Author:

OPTICAL SOCIETY OF AMERICA WASHINGTON DC

Personal Author(s):

Report Date:

1992-04-08

Pagination or Media Count:

162.0

Abstract:

Since the first suggestion of doing projection lithography with soft x-rays was made by Hawryluk and Seppala, and Silvfast and Wood nearly 4 years ago, there has been a flood of activity on many of the basic principles and technologies. Foremost among these has been the development of high reflectivity coatings for mirrors that operate near 130 angstroms, the demonstration of diffraction-limited reduction imaging over a small field, and the design of high efficiency laser plasmas for compact illumination sources. Current work includes construction and repair of reflection masks, designs for large field cameras, and illuminators to couple them to the source, and development of advanced methods to measure and ultimately fabricate precision spherical and aspherical mirrors for large field cameras. Yet a great deal of work has to be done before soft x-ray projection lithography can become even a prototype lithography system, much less a commercial competitor.

Subject Categories:

  • Electrical and Electronic Equipment
  • Manufacturing and Industrial Engineering and Control of Production Systems
  • Fluid Mechanics
  • Optics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE