Accession Number:

ADA254635

Title:

An Investigation of Residual Stresses in Machined Silicon Nitride

Descriptive Note:

Final rept.

Corporate Author:

ARMY LAB COMMAND WATERTOWN MA MATERIAL TECHNOLOGY LAB

Personal Author(s):

Report Date:

1992-07-01

Pagination or Media Count:

25.0

Abstract:

An X-ray diffraction XRD residual stress investigation was conducted on groups of machined silicon nitride specimens utilizing copper K alpha radiation, the 323 0-phase crystallographic planes and the sin2 psi stress-measuring technique. Cylindrical button-head tensile specimens formed by different processes and finish machined by different shops were characterized both before and after heat treatment. Surface machining stresses were also determined on a partial-machined tensile rod and on fractured flexure bars. The residual stress results are presented in the form of a comparative evaluation of processing parameters. Supplemental integrated intensity data from measurements on the partial-machined tensile rod and crushed buttonhead powder samples has demonstrated that XRD residual stress analysis may be applicable as a quality assurance procedure.

Subject Categories:

  • Inorganic Chemistry
  • Ceramics, Refractories and Glass
  • Mechanics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE