Advanced Processing and Characterization Technologies. Fabrication and Characterization of Semiconductor Optoelectronic Devices and Integrated Circuits Held in Clearwater, Florida on 8-10 May 1991. American Vacuum Society Series 10
Conference proceedings no. 10 (Final) 8 Apr 1991-7 Apr 1992,
FLORIDA UNIV GAINESVILLE
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The Topics include Focused-Ion-Beam Micromachining A Fabrication Tool for Prototypal Semiconductor Lasers A Novel Vacuum Lithography with SiNx Resist by Focused Ion Beam Exposure and Dry Etching Development ECR Plasma Etching of III-V Optoelectronic Devices Influence of SiCl4 Reactive Ion Etching on the Electrical Characteristics of GaAs Electron-beam Writing System for Holographic Optical Elements Micro Dry Etching Process for Vertical Cavity Surface Emitting Lasers Sulfide Treatment on III-V Compound Surfaces Sulfur Passivation of GaAs Surfaces Direct Observation of GaAs Surface Cleaning Process Under Hydrogen Radical Beam Irradiation Near Surface Type Conversion of p-type, Single Crystal InP by Plasma Exposure Advances in Controlling Electrical Contacts for Optoelectronics Indium Ohmic Contacts to n-ZnSe A New Method of Zn Diffusion into InP for Optical Device Fabrication Open Tube Double Diffusion for the Fabrication of Bipolar Transistor Waveguide Optical Switch and Full-Water Technology for Laser Fabrication and Testing.
- Inorganic Chemistry
- Electrical and Electronic Equipment
- Electrooptical and Optoelectronic Devices