Accession Number:

ADA254119

Title:

Single Liquid Source Plasma Enhanced Metalorganic Chemical Vapor Deposition of YBa2Cu3O7-x Thin Films

Descriptive Note:

Technical rept.,

Corporate Author:

ADVANCED TECHNOLOGY MATERIALS INC DANBURY CT

Report Date:

1992-07-29

Pagination or Media Count:

13.0

Abstract:

High quality YBa2Cu3O7-x films were grown in-situ on LaA103 100 by a novel single liquid source plasma-enhanced metalorganic chemical vapor deposition process. The metalorganic complexes Mthdn, thd 2,2,6,6- tetramethyl-3,5-heptanedionate M Y, Ba, Cu were dissolved in an organic solution and injected into a vaporizer immediately upstream of the reactor inlet. The single liquid source technique dramatically simplifies current CVD processing and can significantly improve the process reproducibility. X-ray diffraction measurements indicated that single phase, highly c-axis oriented YBa2Cu3O7-x was formed in-situ at a substrate temperature 680 deg C. The as-deposited films exhibited a mirror-like surface, had transition temperature Tco 89 K, Delta Tc 1K, and Jc77K 106 Acm2.

Subject Categories:

  • Physical Chemistry
  • Coatings, Colorants and Finishes
  • Plasma Physics and Magnetohydrodynamics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE