Novel Si-YBCuO Reactive Patterning Technique for Manufacture of Large Area High Tc Superconducting Electronic Devices
Final rept. 1 Sep 1991-31 Mar 1992
THIN FILM CONCEPTS INC ELMSFORD NY
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A technique to pattern YBCuO utilizing rapid thermal annealing to intermix layers such as silicon with the superconductor was analyzed. Films were prepared using laser ablation, and e-beam deposition. Areas that intermixed destroyed the superconductivity and allowed 10 micron lines to be fabricated. The system was evaluated using SEM, Auger, XPS and x-ray diffraction. Another technique was investigated in which silicon films were deposited and patterned over existing YBCuO films. The silicon was patterned and then annealed to define micron-sized superconducting patterns. This technique is relevant to producing large-area superconducting patterns such as delay lines, microwave devices, and packaging interconnects.
- Electricity and Magnetism