Accession Number:

ADA250740

Title:

Novel Si-YBCuO Reactive Patterning Technique for Manufacture of Large Area High Tc Superconducting Electronic Devices

Descriptive Note:

Final rept. 1 Sep 1991-31 Mar 1992

Corporate Author:

THIN FILM CONCEPTS INC ELMSFORD NY

Personal Author(s):

Report Date:

1992-04-07

Pagination or Media Count:

23.0

Abstract:

A technique to pattern YBCuO utilizing rapid thermal annealing to intermix layers such as silicon with the superconductor was analyzed. Films were prepared using laser ablation, and e-beam deposition. Areas that intermixed destroyed the superconductivity and allowed 10 micron lines to be fabricated. The system was evaluated using SEM, Auger, XPS and x-ray diffraction. Another technique was investigated in which silicon films were deposited and patterned over existing YBCuO films. The silicon was patterned and then annealed to define micron-sized superconducting patterns. This technique is relevant to producing large-area superconducting patterns such as delay lines, microwave devices, and packaging interconnects.

Descriptors:

• *SUPERCONDUCTIVITY
• *THIN FILMS
• *ANNEALING
• FILMS
• MICROWAVES
• LASERS
• DEPOSITION
• DIFFRACTION
• SILICON
• DELAY
• PATTERNS
• PACKAGING
• AUGERS
• YTTRIUM COMPOUNDS
• X RAY DIFFRACTION
• SUPERCONDUCTORS
• DELAY LINES
• LAYERS

Subject Categories:

• Electricity and Magnetism

Distribution Statement:

APPROVED FOR PUBLIC RELEASE