Accession Number:
ADA250740
Title:
Novel Si-YBCuO Reactive Patterning Technique for Manufacture of Large Area High Tc Superconducting Electronic Devices
Descriptive Note:
Final rept. 1 Sep 1991-31 Mar 1992
Corporate Author:
THIN FILM CONCEPTS INC ELMSFORD NY
Personal Author(s):
Report Date:
1992-04-07
Pagination or Media Count:
23.0
Abstract:
A technique to pattern YBCuO utilizing rapid thermal annealing to intermix layers such as silicon with the superconductor was analyzed. Films were prepared using laser ablation, and e-beam deposition. Areas that intermixed destroyed the superconductivity and allowed 10 micron lines to be fabricated. The system was evaluated using SEM, Auger, XPS and x-ray diffraction. Another technique was investigated in which silicon films were deposited and patterned over existing YBCuO films. The silicon was patterned and then annealed to define micron-sized superconducting patterns. This technique is relevant to producing large-area superconducting patterns such as delay lines, microwave devices, and packaging interconnects.
Descriptors:
Subject Categories:
- Electricity and Magnetism