Final Phase 1 Technical Report (Wisconsin Univ, Madison, Center for X- Ray Lithography)
Final rept. 25 Apr 1989-28 Feb 1991
WISCONSIN UNIV-MADISON STOUGHTON CENTER FOR X-RAY LITHOGRAPHY
Pagination or Media Count:
Three principal tasks have been assigned by the NRL to the University of Wisconsin-Madison Center for X-ray Lithography. The first task involves the integration of the SVG Lithography originally Perkin-Elmer Corp. vertical-stage stepper to the synchrotron X-ray source, Aladdin. This task involves the design and construction of the beamline optics, electronics, vacuum, and mechanics to deliver stable and uniform X-ray flux over a 25 mm by 50 mm field to the SVG Lithography stepper. Incorporated in this task is the development of the instrumentation from the beamline to SVG Lithography stepper, i.e. flux information, scan rate and position sensors, etc., and the appropriate in-situ monitors to the beamline, e.g. vacuum information, mirror contamination status, etc. The final aspect of this first task involves the installation and characterization of the SVG Lithography Stepper and beamline systems in the clean room at the CXrL. The second and third tasks involve the design and construction of two clean rooms a stepper clean room to house and support the vertical-stage stepper and its instrumentation and a process clean room facility, which will be used to perform X-ray resist processing, resist cleanup, and inspection.