Materials Processing of Diamond: Etching, Doping by Ion Implantation and Contact Formation
Final technical rept. 1 May 1987-31 Dec 1991
NORTH CAROLINA UNIV AT CHAPEL HILL DEPT OF PHYSICS AND ASTRONOMY
Pagination or Media Count:
A summary of work achieved under this grant is given, including ion implantation doping of natural diamond, annealing of implantation damage, characterization methods, contact formation using a sputtering method, and plasma etching.
- Electricity and Magnetism