New Approach to Chemically Induced Silicon Oxidation
LEHIGH UNIV BETHLEHEM PA SHERMAN FAIRCHILD CENTER FOR SOLID STATE STUDIES
Pagination or Media Count:
The project New Approach to Chemically Induced Silicon Oxidation suggested a new and different approach to oxidation by the addition of small concentrations of a fluorine compound to the oxidation strain. This novel approach was successfully carried out within the framework of state-of-the-art oxidation technology. The objectives for the study were divided into four sections and the core elements of these sections are study of oxidation kinetics with original source dichlorofluorethane, Study of temperature, time, volume additions involves MOS characterization and effect of hot carriers influence of this process on stacking faults, furnace ambients and other oxidation related effects and investigate use of other compounds for this purpose.
- Physical Chemistry
- Ceramics, Refractories and Glass