Accession Number:

ADA242617

Title:

HREELS and UPS Studies of PH3 and PD3 on Si(110)

Descriptive Note:

Technical rept.,

Corporate Author:

EMORY UNIV ATLANTA GA

Personal Author(s):

Report Date:

1991-01-01

Pagination or Media Count:

15.0

Abstract:

Various phosphorous compounds have been employed for semiconductor doping and chemical vapor deposition CVD of thin films such as InP. Phosphine PH3, one of the smallest stable P-compounds, has been used most commonly as a CVD source molecule. Many studies have been made to elucidate the mechanisms of PH3 adsorption and decomposition on different metal surfaces, such as Rh, Rh Al2O3, Ag, Pt, Ni and polycrystalline Fe under UHV conditions. Some experiments have also been conducted on silicon surfaces, including polycrystalline silicon. At low temperatures, PH3 may either molecularly adsorb or dissociatively adsorb on various surfaces, depending on the nature of surfaces.

Subject Categories:

  • Inorganic Chemistry
  • Solid State Physics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE