Accession Number:

ADA238130

Title:

A Study of Copper Segregation in Sputtered Al-Si-Cu Films Using Auger Electron Spectroscopy

Descriptive Note:

Memorandum rept.,

Corporate Author:

ROYAL SIGNALS AND RADAR ESTABLISHMENT MALVERN (UNITED KINGDOM)

Personal Author(s):

Report Date:

1991-01-01

Pagination or Media Count:

34.0

Abstract:

A study has been made, using Auger Electron Spectroscopy AES, of copper copper segregation in Aluminium Silicon Copper films processed in the Silicon Processing and Evaluation Laboratory SPEL. The AES technique and its interpretation are briefly discussed. A description of the Auger Spectrometer and experimental details are also provided. The effects of variations in layer thickness and annealing temperatures on the interface between the Al-Si-Cu and the silicon substrate were studied. Results obtained from other samples from British Telecom research laboratories, and alternative analysis methods such as Rutherford Backscattering RBS are also discussed and conclusions drawn as to the nature of this segregation.

Subject Categories:

  • Metallurgy and Metallography

Distribution Statement:

APPROVED FOR PUBLIC RELEASE