Pressure Effects in the Microwave Plasma Growth of Polycrystalline Diamond
ROCKWELL INTERNATIONAL CORP THOUSAND OAKS CA SCIENCE CENTER
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Microwave plasma deposition of polycrystalline diamond is being investigated over the pressure range 1 to 100 kPa. the conditions of growth, microstructure, and spectroscopic properties of the resulting materials are being compared. A phenomenological description of the dependence of diamond microstructure upon growth conditions has been developed. Diamond films were grown in two different flow systems both using an Applied Science 1.5kW, 2.45GHz magnetron source and waveguide arrangements. All substrate surfaces were prepared by diamond paste abrasion before deposition. Polycrystalline particles and films were examined by scanning electron microscopy and Raman spectroscopy.