Accession Number:

ADA234867

Title:

A Combined XPS-ISS-Modulated Molecular Beam Investigation of the Reactions of Oxygen and Fluorine with Silicon Surfaces

Descriptive Note:

Final rept. 1987-1991

Corporate Author:

WASHINGTON UNIV SEATTLE DEPT OF CHEMISTRY

Personal Author(s):

Report Date:

1991-02-15

Pagination or Media Count:

11.0

Abstract:

The chemical reaction between Si100 and molecular and atomic oxygen and fluorine has been studied. Using modulated molecular beam mass spectrometry, XPS and ISS, the kinetics of adsorption reaction and desorption have been studied in detail. Atomic fluorine and oxygen are much more reactive at high coverages than their molecular counterparts. At low coverages, this is true for O, but not for F.

Descriptors:

Subject Categories:

  • Physical Chemistry

Distribution Statement:

APPROVED FOR PUBLIC RELEASE