A Combined XPS-ISS-Modulated Molecular Beam Investigation of the Reactions of Oxygen and Fluorine with Silicon Surfaces
Final rept. 1987-1991
WASHINGTON UNIV SEATTLE DEPT OF CHEMISTRY
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The chemical reaction between Si100 and molecular and atomic oxygen and fluorine has been studied. Using modulated molecular beam mass spectrometry, XPS and ISS, the kinetics of adsorption reaction and desorption have been studied in detail. Atomic fluorine and oxygen are much more reactive at high coverages than their molecular counterparts. At low coverages, this is true for O, but not for F.
- Physical Chemistry