Accession Number:

ADA234358

Title:

Cluster Beam Deposition of High Temperature Materials

Descriptive Note:

Technical rept.

Corporate Author:

STATE UNIV OF NEW YORK AT BUFFALO DEPT OF CHEMISTRY

Personal Author(s):

Report Date:

1991-01-01

Pagination or Media Count:

8.0

Abstract:

We present our latest attempts to utilize a Smalley-type source to generate novel thin films. This technique employs entraining, within a high pressure molecular beam expansion, the products generated from laser ablation of a rotating target rod. We show how just such a cluster beam source can be used to generate a high temperature material within a molecular beam and deposit it intact on a relatively cool substrate. By tailoring the various expansion conditions i.e., expansion pressure, laser fluence, type of carrier gas, pulse delay, etc... one can drastically effect the morphology and chemical nature of the surface generated. This technique has promise that it may be able to fabricate a wide variety of thin films with obvious industrial applications superconducting thin films, diamond-like carbon films, patterned or multi- layered thin films.

Subject Categories:

  • Electrical and Electronic Equipment

Distribution Statement:

APPROVED FOR PUBLIC RELEASE