Accession Number:

ADA232036

Title:

Wavelength Independent Optical Lithography and Microscopy

Descriptive Note:

Final rept. 1 Sep 1987-31 Aug 1990

Corporate Author:

CORNELL UNIV ITHACA NY SCHOOL OF APPLIED AND ENGINEERING PHYSICS

Personal Author(s):

Report Date:

1990-10-30

Pagination or Media Count:

48.0

Abstract:

During the past contract period we have successfully established the field or near-field optics and subwavelength light beam technology. We have experimentally verified some of the physical parameters upon which the collimation of light in the near-field depends and have demonstrated that collimation better than one tenth the wavelength can be achieved in both transmission imaging and reflection imaging and that lithographic replication at one fifth the wavelength is attainable. In addition, we have also demonstrated that darkline defects in GRIN-SCH-SQW diode lasers can be directly observed at high spatial resolution using methods of lenseless near-field imaging.

Subject Categories:

  • Lasers and Masers
  • Manufacturing and Industrial Engineering and Control of Production Systems
  • Test Facilities, Equipment and Methods
  • Optics
  • Solid State Physics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE