Accession Number:

ADA231291

Title:

Distortion-Free X-Ray Mask Technology

Descriptive Note:

Quarterly technical rept. 12 Sep-11 Dec 1990,

Corporate Author:

MASSACHUSETTS INST OF TECH CAMBRIDGE RESEARCH LAB OF ELECTRONICS

Personal Author(s):

Report Date:

1991-01-23

Pagination or Media Count:

6.0

Abstract:

The objective of this research project is to develop a closed-loop, feedback-controlled, robust system for reliably achieving zero stress in tungsten W films sputtered onto various x-ray mask membranes, and to transfer the technology to the National X-ray mask shop. Our system for controlling stress in sputtered W films is based on the measurement of resonant frequency. Since resonant frequency depends on both the thickness and the stress of W films, if the thickness is known, the stress is easily calculated.

Subject Categories:

  • Metallurgy and Metallography
  • Manufacturing and Industrial Engineering and Control of Production Systems
  • Photography

Distribution Statement:

APPROVED FOR PUBLIC RELEASE