Distortion-Free X-Ray Mask Technology
Quarterly technical rept. 12 Sep-11 Dec 1990,
MASSACHUSETTS INST OF TECH CAMBRIDGE RESEARCH LAB OF ELECTRONICS
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The objective of this research project is to develop a closed-loop, feedback-controlled, robust system for reliably achieving zero stress in tungsten W films sputtered onto various x-ray mask membranes, and to transfer the technology to the National X-ray mask shop. Our system for controlling stress in sputtered W films is based on the measurement of resonant frequency. Since resonant frequency depends on both the thickness and the stress of W films, if the thickness is known, the stress is easily calculated.
- Metallurgy and Metallography
- Manufacturing and Industrial Engineering and Control of Production Systems