Nucleation and Growth of Diamond on Si, Cu and Au Substrates
BROWN UNIV PROVIDENCE RI DEPT OF CHEMISTRY
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A hot tungsten filament reactor was used to deposit diamond films on silicon, copper and gold substrates. Diamond can be readily nucleated on all three substrates, but the nucleation density is greatly enhanced by prescratching with o.25 um diamond paste. Visual examination of photomicrographs of diamond crystallites formed on prescratched silicon substrates indicates that no new nuclei are formed between one and two hrs of deposition. However, new nuclei are formed throughout this period when the substrate is copper or gold. Deposited diamond films adhered to silicon substrates, but could be readily removed from copper and gold substrates.
- Industrial Chemistry and Chemical Processing