In-Situ Patterning: Selective Area Deposition and Etching. Materials Research Society Symposium Proceedings. Volume 158
Final rept. 22 Nov 1989-21 Nov 1990
MATERIALS RESEARCH SOCIETY PITTSBURGH PA
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The MRS symposium on In-Situ Patterning Selective Area Deposition and Etching brought together a wide selection of microfabrication technologies and detailed studies of their enabling mechanisms. The common thread through the invited and contributed papers is the chemical andor physical alteration of surfaces by the actions of ion, electron, or photon energy. The applications ranged from state-of-the-art lithographic techniques, to direct processing of semiconductor surfaces, aiming to obviate lithography in device fabrication. This direct processing encompasses patterned deposition of metallic conductors and insulating films, as well as local etching and doping of device structures. The work demonstrated in this symposium ranged from the detailed atomic behavior of treated surfaces, to nuts-and-bolts packaging techniques for the high-density descendants of todays printed circuit boards.
- Printing and Graphic Arts