Patterned Functionalization of Gold and Single Crystal Silicon via Photochemical Reaction of Surface-Confined Derivatives of (Eta5-C5H5)MN(CO)3
Technical rept. no. 42
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Treatment of a single crystal Si wafer n- or p-type, 100 face having a thin surface SiOx layer with Cl3Si-eta5-C5H4MnCO3, I, yields the Si-confined complex Si-O-Si-eta5-C5H4MnCO3. Coverage of about a monolayer is typically achieved. Near-UV irradiation of the Si-confined tricarbonyl in L PPh2n-octyl gives the surface-confined substitution product Si-O-Si-eta5- C5H4MnCO2L. The identities of the Si-confined complexes were determined by comparison of their IR CO stretching frequencies with those of CH33Si-eta5- C5H4MnCO2L, and of the corresponding high surface area SiO2-confined species, SiO2-O-Si CH32-eta5-C5H4MnCO2L L CO, PPhn-octyl. Treatment of a Au- coated Si wafer with HSCH211-eta5-C5H4MnCO3, II, yields about a monolayer of the Au-confined complex AuSCH211-eta5-C5H4MnCO3. Near-UV irradiation of the Au-confined tricarbonyl in the presence of L PPh2n-octyl yields the surface-confined substitution product Au-SCH211-eta5-C5H4MNCO2L. The photochemistries of surface-confined I and II differ from the photochemistries of the corresponding solution species. Patterning of the surface of a Si wafer modified with I or of Au modified with II is readily accomplished, since photosubstitution occurs only on irradiated portions of the surface.
- Physical Chemistry
- Radiation and Nuclear Chemistry