Accession Number:

ADA229094

Title:

OH Contamination Flux Estimates.

Descriptive Note:

Technical rept. 9 May 1988-31 Aug 1990,

Corporate Author:

SPECTRAL SCIENCES INC BURLINGTON MA

Personal Author(s):

Report Date:

1990-09-10

Pagination or Media Count:

17.0

Abstract:

Contamination on a cryogenic mirror is considered from two sources. The first source is the deposition of OH formed by the gas phase reaction of atmospheric atomic oxygen with outgassing H2 coolant. The second source is deposition of OH formed by surface reaction of atomic oxygen and atomic hydrogen from the atmosphere. Variations in atmospheric temperature and direction of the mirror with respect to the ram are evaluated. It is found that deposition due to reaction of outgassing products is likely to be smaller than that resulting from the atmospheric mechanism. Keywords Contamination, OH Deposition, Mirrors, Optics. js

Subject Categories:

  • Optics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE