Accession Number:

ADA222919

Title:

The Preparation of ACEL Thin Films

Descriptive Note:

Final rept.

Corporate Author:

VECHT (ARON) AND ASSOCIATES LONDON (UNITED KINGDOM)

Personal Author(s):

Report Date:

1990-05-01

Pagination or Media Count:

14.0

Abstract:

Although thin film ACEL devices have become commercially available, the number of companies producing these displays has continued to diminish. The cause of their demise was not display performance, as both sufficient brightness and efficiency has been achieved, but the low return on the heavy capital investment due to the poor yields obtained in production. In order to make ACEL thin film devices more viable, the capital investment needs to be low andor the production yields high. Opting for relatively expensive sputtering or ALE techniques as the sole methods of fabricating EL structures, is both commercially and scientifically ill-advised. Considerable effort was spent in developing cheaper alternative techniques for thin film deposition. The main objectives of the contract can be summarised as follows a To deposit high quality ZnS thin films by MOCVD, b To dope the ZnS thin film with Mn, c To deposit high quality dielectric films using a novel spray pyrolysis process, d To evaluate optimised insulatorZnS.Mninsulator structures, e The fabrication of large area XY matrix ACEL structures. Great Britain.

Subject Categories:

  • Electrooptical and Optoelectronic Devices
  • Manufacturing and Industrial Engineering and Control of Production Systems

Distribution Statement:

APPROVED FOR PUBLIC RELEASE