Accession Number:

ADA218714

Title:

Gas Phase Decomposition of an Organometallic Chemical Vapor Decomposition Precursor to A1N: (Al(CH3)2NH2)3

Descriptive Note:

Technical rept.

Corporate Author:

RENSSELAER POLYTECHNIC INST TROY NY DEPT OF CHEMISTRY

Report Date:

1990-01-15

Pagination or Media Count:

8.0

Abstract:

A novel technique for probing chemical vapor deposition reaction mechanisms is presented. A conventional hot-wall Pyrex reactor is coupled to a molecular beam apparatus. Preliminary results of the decomposition of an organmetallic precursor Aluminum Nitride, AlCH32NH23, indicate a decomposition temperature between 200 and 270 C. The mass spectrum of the precursor at 100 C provides evidence for the existence of a trimer-dimer equilibrium of the precursor at this temperature. Keywords Methylamides Reprints.

Subject Categories:

  • Industrial Chemistry and Chemical Processing
  • Organic Chemistry
  • Physical Chemistry

Distribution Statement:

APPROVED FOR PUBLIC RELEASE