Modified Maleic Anhydride Copolymers as E-Beam Resists
CORNELL UNIV ITHACA NY SCHOOL OF CHEMICAL ENGINEERING
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Copolymers of maleic anhydride with styrene, ethylene, and methyl vinyl ether were modified and evaluated for use as negative working resist materials in electron beam lithography. The copolymers used were modified by reaction with an organometallic compound, which resulted in incorporation of tin in the pendant chains of the copolymers. The polymers were blended with a reactive plasticizer, dipentaerythritol pentaacrylate DPEPA, to enhance sensitivity and to improve resolution. Incorporation of tin into the copolymer resulted in increased sensitivity to the electron beam, improved dimensional stability, and increased oxygen reactive ion resistance. Tin modified polymers blended with DPEPA yielded sensitivities in the range of 0.2 to 1.5 microCsq. cm.
- Industrial Chemistry and Chemical Processing
- Polymer Chemistry
- Printing and Graphic Arts