Low Temperature Deposition of Diamond Films for Optical Coatings
NORTHWESTERN UNIV EVANSTON IL DEPT OF MATERIALS SCIENCE AND ENGINEERING
Pagination or Media Count:
A low temperature approx. 400 oC plasma enhanced chemical vapor deposition process has been developed to grow diamond films for optical coatings application. Films with fine grains or 3000 A have been obtained by controlling diamond nucleation. The surface roughness of the films is on the order of 50-200. The optical transparency of the films is over 60 in the range of 0.6 micrometer wavelength, which is comparable to that of typed lla natural diamond. Using a block-on ring tribotester, it is found that the diamond films adhere well to quartz substrates.
- Coatings, Colorants and Finishes