Accession Number:

ADA209699

Title:

A Bolt-on Deposition Source for Ultra-High-Vacuum Growth of Intermetallic Compound Films

Descriptive Note:

Technical rept.

Corporate Author:

CALIFORNIA UNIV LOS ANGELES

Report Date:

1989-07-01

Pagination or Media Count:

11.0

Abstract:

An eight-inch ConFlat flange assembly with both an electron-beam evaporator and a Knudsen cell has been constructed to deposit intermetallic compounds containing transition and group-III metals with specific phase composition. Initial depositions of thin films using this design have shown excellent epitaxy with the desired compound stoichiometry. Thin film growth, Transition metals, Low vapor pressure, Deposition pressure, Material evaporation, Stoichiometry control, Single crystal epitaxy.

Subject Categories:

  • Electrical and Electronic Equipment

Distribution Statement:

APPROVED FOR PUBLIC RELEASE