A Soluble Photosensitive Polyimide
RENSSELAER POLYTECHNIC INST TROY NY DEPT OF CHEMISTRY
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We have been studying an intrinsically photosensitive polymide derived from cyclobutane dianhydride and oxydianiline which exhibits both good thermal stability 50 weight loss at 460 C and high deep ultraviolet sensitivity 45mJcm21. However, the insolubility of cured polyimide films complicates the detailed mechanistic investigation of the photochemical process. We have therefore prepared a soluble homolog of this system which is derived from the photodimer of methyl maleic anhydride dimethyl cyclobutane dianhydride. This material may also be imaged with deep ultraviolet radiation and exhibits good thermal stability. A discussion of the photochemical behavior of this soluble system will be presented.