Microfabrication of WO3-Based Microelectrochemical Devices
Technical interim rept. no. 27, 1 Jun 1988-12 Jun 1989
MASSACHUSETTS INST OF TECH CAMBRIDGE DEPT OF CHEMISTRY
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A new photolithographic process for the patterning of Tungsten trioxide is reported. A layer of RF sputtered polycrystalline WO3 can be patterned by a combination of photolithographic and dry etching processes to selectively cover a fraction of eight Platinum microelectrodes each approx. 50 micrometers long, 2 micrometers wide, and 0.3 micrometers thick and spaced 1.2 micrometers apart. The modified microelectrode arrays were characterized by electrochemistry, by surface profilometry, and by scanning electron microscopy. A pair of microelectrodes connected by WO3 comprises a microelectrochemical transistor with pH-dependent electrical characteristics based on the pH and potential dependent conductivity of WO3 associated with the reversible electrochemical reaction WO3 nH ne- yields HnWo3.
- Industrial Chemistry and Chemical Processing
- Physical Chemistry
- Electrical and Electronic Equipment