Accession Number:

ADA209064

Title:

Applied Field and Total Dose Dependence of Trapped Charge Buildup in MOS Devices

Descriptive Note:

Technical rept.

Corporate Author:

AEROSPACE CORP EL SEGUNDO CA ELECTRONICS RESEARCH LAB

Report Date:

1989-04-26

Pagination or Media Count:

26.0

Abstract:

A rate equation for charge buildup which includes carrier sweep out, geminate recombination, holeelectron trapping, and effects of internal fields is developed. The first moment of the resulting charge distribution is calculated to yield the midgap voltage shift as a function of irradiation time. The initial midgap voltage shift per dose and the maximum midgap voltage shift are derived. The field dependence of these quantities is shown to be a consequence of the field dependence of the holeelectron capture cross sections and geminate recombination escape probability. The results of this formulation show that the E to the 12 power decrease in the midgap shift per dose with increasing applied field. The theory is validated by comparison with experimental results obtained on 225 A thermal oxide on p-type silicon test capacitors irradiated under bias at room temperature.

Subject Categories:

  • Solid State Physics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE