An X-Ray Source for Lithography Based on a Quasi-Optical Maser Undulator
NAVAL RESEARCH LAB WASHINGTON DC
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The use of electromagnetic waves is proposed as an undulator in order to generate x-rays in the wavelength range required for fabrication of integrated circuits. The configuration consists of a quasi optical maser cavity through which a beam of relativistic electrons is made to propagate, spontaneously emitting x-rays of the desired energy. For 5 silicon wafers covered with a sensitive resist such as PBS, this translates into a throughput of 26 wafershr using an aggressive stepper. The scaling of x-ray power with wavelength indicates that the throughput can be increased substantially using resist which are sensitive to shorter wavelength x-rays.
- Lasers and Masers
- Manufacturing and Industrial Engineering and Control of Production Systems