Accession Number:

ADA208522

Title:

An X-Ray Source for Lithography Based on a Quasi-Optical Maser Undulator

Descriptive Note:

Interim rept.

Corporate Author:

NAVAL RESEARCH LAB WASHINGTON DC

Personal Author(s):

Report Date:

1989-05-09

Pagination or Media Count:

46.0

Abstract:

The use of electromagnetic waves is proposed as an undulator in order to generate x-rays in the wavelength range required for fabrication of integrated circuits. The configuration consists of a quasi optical maser cavity through which a beam of relativistic electrons is made to propagate, spontaneously emitting x-rays of the desired energy. For 5 silicon wafers covered with a sensitive resist such as PBS, this translates into a throughput of 26 wafershr using an aggressive stepper. The scaling of x-ray power with wavelength indicates that the throughput can be increased substantially using resist which are sensitive to shorter wavelength x-rays.

Subject Categories:

  • Lasers and Masers
  • Manufacturing and Industrial Engineering and Control of Production Systems

Distribution Statement:

APPROVED FOR PUBLIC RELEASE