Accession Number:

ADA207853

Title:

Measurements and Modelling of Thin Silicon Dioxide Films on Silicon

Descriptive Note:

Interim technical rept.

Corporate Author:

NORTH CAROLINA UNIV AT CHAPEL HILL DEPT OF CHEMISTRY

Report Date:

1989-05-09

Pagination or Media Count:

27.0

Abstract:

The ellipsometric measurement of refractive indices for films less than 50 nm thick is of dubious quality due to the significance of the size of random errors relative to the accuracy required to extract reliable index values from the measurements. In this study the various errors are quantitatively assessed as a function of the film thickness, and then compared with experimental data obtained from differently prepared silicon dioxide films on silicon. The new results confirm previous work that shows higher refractive indices for thinner films. Transmission electron microscopy results confirm the results and graded and discreet layer models are compared.

Subject Categories:

  • Electrical and Electronic Equipment

Distribution Statement:

APPROVED FOR PUBLIC RELEASE