Accession Number:

ADA202274

Title:

Hole Formation (Etching) in Polymers by Far (Deep) UV High Intensity Laser (Eximer) Radiation Pulses and Its Relevance to Photoresists in Deep UV photolysis of Polymers

Descriptive Note:

Final rept. 1 May 1985-31 Dec 1987

Corporate Author:

CLARKSON UNIV POTSDAM NY DIV OF RESEARCH

Personal Author(s):

Report Date:

1988-10-20

Pagination or Media Count:

39.0

Abstract:

Pulsed eximer laser light 193nm has been used to study the photo and thermal induced degradation ablation of six common, industrially important polymers. A spoon gauge was employed to determine the rate loss of gaseous products from a film. Optical microscopy allowed visualization of the changes that take place in the polymer near the site of hole formation. Little correlation was observed between the depth of holes generated and ave. pulse power or total energy applied. Temperature increases in the polymer film were monitored during irradiation. An attempt was made to correlate calculated and experimental ejection velocities of oligomer fragments of polymer formal by irroliation. The amount of such sputtered material is small as opposed to gaseous products. Correlations were made between the percent transmission of infrared light through each type of polymer and the number of pulses. Keywords Photoresists, Photolysis, Polymethylmethacrylate Plexiglass, Polyimide Kapton, Polycarbonate, Polystyrene, Polypropylene and Polyethyleneterephthalate, Polymeric films.

Subject Categories:

  • Radiation and Nuclear Chemistry
  • Polymer Chemistry
  • Electrical and Electronic Equipment
  • Plastics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE