Accession Number:

ADA191228

Title:

Micro-Raman Analysis of Dielectric Optical Thin Films.

Descriptive Note:

Final technical rept. 1 May 85-30 Sep 87,

Corporate Author:

ROCHESTER UNIV N Y LAB FOR LASER ENERGETICS

Personal Author(s):

Report Date:

1988-01-07

Pagination or Media Count:

24.0

Abstract:

Wide-band-gap dielectric thin films up to 6 micrometer in thickness are characterized by spontaneous and stimulated Raman-gain microscopy. Materials surveyed are Aluminum oxide, Yttrium oxide, Zirconium oxide, Hafnium oxide, and Tantalum oxide. 1-micrometer sized surface defects on Y2O3 are investigated.

Subject Categories:

  • Inorganic Chemistry

Distribution Statement:

APPROVED FOR PUBLIC RELEASE