Accession Number:

ADA190913

Title:

Limited Reaction Processing for Semiconductor Device Fabrication.

Descriptive Note:

Final rept. 30 Sep 85-30 Nov 87,

Corporate Author:

STANFORD UNIV CA STANFORD ELECTRONICS LABS

Personal Author(s):

Report Date:

1987-12-01

Pagination or Media Count:

91.0

Abstract:

A new class of semiconductor processing equipment is shown to be feasible. Test equipment has been designed and fabricated which uses a combination of Rapid Thermal and Chemical Vapor Deposition CVD technologies to achieve epitaxial growth and deposition of semiconductors and insulators. The trend towards single wafer processing makes Limited Reaction Processing LRP particularly relevant to state of the art device fabrication research. Keywords Rapid thermal processing, Semiconductor devices Semiconductors Insulators Limited reaction processing Chemical vapor deposition.

Subject Categories:

  • Electrical and Electronic Equipment
  • Inorganic Chemistry

Distribution Statement:

APPROVED FOR PUBLIC RELEASE