Accession Number:

ADA184766

Title:

Ion Plating: Fundamental Processing Studies and Synthesis of High Performance Coatings.

Descriptive Note:

Final rept. Nov 83-Apr 87,

Corporate Author:

ILLINOIS UNIV AT URBANA DEPT OF MATERIALS SCIENCE AND ENGINEERING

Personal Author(s):

Report Date:

1987-08-04

Pagination or Media Count:

6.0

Abstract:

Ion plating is a physical vapor deposition process which uses a plasma to modify the microstructuremicrochemistry of thin film coatings. This research has directly shown that processing variables such as plasma energydensity substrate temperature deposition rate and substrate surface chemistry directly effect the deposited film microstructure and chemistry. This processing technique allows mechanically strongchemically graded interface layers to be produced between dissimilar material. Film adhesion with this process is correspondingly excellent. This process was used to produce corrosion and wear resistant hard coatings.

Subject Categories:

  • Coatings, Colorants and Finishes

Distribution Statement:

APPROVED FOR PUBLIC RELEASE