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Chemisorption and Reactions of Molecules on Semiconductor Surfaces.
Final technical rept. 1 Apr 77-31 Mar 85,
IBM THOMAS J WATSON RESEARCH CENTER YORKTOWN HEIGHTS NY
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We have performed experimental measurements of adsorbed atoms and molecules on metal and semiconductor surfaces over a wide range of temperatures 20K - 100K to identify the nature of bonding, the structure, reaction intermediates and reaction products. This has included simple hydrocarbon and organic molecules on Ni, Pd, Pt and Ag single-crystal surfaces. The techniques of UV photoemission, low energy electron diffraction and high resolution electron energy loss spectroscopy were used and further developed to extract new information. The electronically excited states of absorbates relevant to Surface Enhanced Raman and Surface Chemistry were also investigated. Later work on Si111 surfaces included studies of oxidation, water adsorption and metallization.
APPROVED FOR PUBLIC RELEASE