Micro-Raman Analysis of Dielectric Thin Films.
Annual rept. 1 May 85-30 Apr 86,
ROCHESTER UNIV N Y LAB FOR LASER ENERGETICS
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The long-term motivation of our program Micro-Raman-Analysis of Dielectric Thin Films is the acquisition of an understanding of stress and the role of defects in the growth of optical performance of defects in the growth and optical performance of dielectric thin films. By dielectric films we mearn films comprising materials that are suitable for high-power laser applications in the visible and near UN. Materials with intrinsic band gaps exceeding 3.5 eV are of interest here. Before the initiation of this program there was considerable research activity in the area of narrow band gap materials, mostly semiconductors, in which Raman spectroscopy answered questions of film morphology, doping levels and carrier dynamics.
- Electricity and Magnetism
- Electrooptical and Optoelectronic Devices
- Lasers and Masers