Spatially Selective Photoelectrochemistry.
Final rept. 1 Aug 79-31 Oct 86,
EIC LABS INC NORWOOD MA
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This porgram has dealt with applications of photoelectrochemistry to semiconductor technology. Light localized etching and electroplating have been demonstrated for n-GaAs, including imaging with a computer-controlled focused laser light source and crystallographically enhanced photoelectrochemical etching using conventional photoresist masks. These studies have resulted in new processes for high aspect ratio etching in compound semiconductors, and in fabrication of sawtooth Eschelle-type diffraction gratings for spectroscopy and integrated electro-optics.
- Solid State Physics