Accession Number:

ADA179880

Title:

Ion Beam Processing.

Descriptive Note:

Final rept.,

Corporate Author:

NAVAL RESEARCH LAB WASHINGTON DC

Personal Author(s):

Report Date:

1987-03-13

Pagination or Media Count:

82.0

Abstract:

This memo introduces ion implantation processing. The introduction and background sections present applications that might be considered for ion implantation processing and give a brief description of the apparatus and the physical principles underlying the techniques. The entire process of ion beam processing is described to allow the reader to plan treatment parameters for parts andor to double check treatment parameters recommended by vendors. This document provide workers in the field with a handbook of tables, graphs and equations that are needed for doing ion implantation processing. These include tables of ion ranges and straggling, formulae and tables which allow estimates to be simply made for sputtering coefficients, depth profiles of implanted elements, damage profiles, dose for sputter saturation of implanted profiles, temperatures reached by parts in vacuum during implantation, and estimates of the time and cost of ion implantation. Keywords Ion implantation Surface modification Ion beam analysis Ion beam processing Corrosion Ion Range Sputtering Materials processing Applications of ion implantation Wear Straggling Alloy formation Tribology.

Subject Categories:

  • Manufacturing and Industrial Engineering and Control of Production Systems
  • Physical Chemistry

Distribution Statement:

APPROVED FOR PUBLIC RELEASE