Accession Number:

ADA171935

Title:

Wavelength Independent Optical Lithography.

Descriptive Note:

Annual rept. 1 Sep 84-31 Aug 85,

Corporate Author:

CORNELL UNIV ITHACA NY SCHOOL OF APPLIED AND ENGINEERING PHYSICS

Personal Author(s):

Report Date:

1986-06-06

Pagination or Media Count:

81.0

Abstract:

Near-Field Diffraction by a Slit Implications for Super-Resolution Microscopy--The transmission of light through an infinite slit in a thick, perfectly conducting screen is investigated. The spatial distribution of the near-field energy flux is determined through the formulation of four coupled integral equations, which are solved numerically. Transmission coefficients calculated by this method are in agreement with those determined by an alternative formulation. Near-Field Scanning Optical Microscopy NSOM--A new method for high resolution imaging, near field scanning optical microscopy NSOM, has been developed. The concepts governing this method are discussed, and the technical challenges encountered in constructing a working NSOM instrument are described. Two distinct methods are presented for the fabrication of well characterized, highly reproducible, sub-wavelength apertures. Author

Subject Categories:

  • Optics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE