Applied Surfac Science. Volume 25. Number 4,
MARYLAND UNIV COLLEGE PARK
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Contents Quantitative analysis of mixtures by Auger electron spectroscopy Low work function emitter electrodes for advanced thermionic converters In situ Auger electron spectroscopy applied to the study of chemisorption and diffusion during reactive implantation of titanium into iron Stoichiometric changes in the surface of 100 cubic SiC caused by ion bombardment and annealing A SIMS study of ion beam induced migration of nitrogen in thermally oxidized silicon Material displacing processes and surface texture Formation of silicon carbide in silicion substrates during CF4 H2 dry etching Special techniques for the Auger analysis of microelectronic devices Using asngle resolved ESCA to characterize Winchester disks An evaluation of the bremsstrahlung contribution to specimen damage in XPS using Auger peak intensities.
- Atomic and Molecular Physics and Spectroscopy