Ion Assisted Deposition of Optical Coatings.
AIR FORCE INST OF TECH WRIGHT-PATTERSON AFB OH
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The effects on the properties of Ta2O5, Al2O3, SiO2 and HfO2 single- and multi-layer optical coatings deposited using ion assisted deposition IAD were investigated. IAD is a novel deposition technique which utilizes a separate ion source to direct a beam of ions at the growing film. A Kaufman ion source was used to provide a monoenergetic, neutralized beam of oxygen ions independent of the material evaporation process. The optical and physical properties, as well as laser induced damage threshold LIDT values, were studied for coatings bombarded with 200, 300, 500 and 1000 eV oxygen ions at values of current density from 0 to 200 microAmpsq cm. IAD was successfully applied to deposit coatings at low temperature on heavy metal fluoride HMF glass substrates. The coatings deposited using IAD were hard and dense. The IAD coatings improved the durability and abrasion resistance of the HMF glass substrates. The results of this investigation show that IAD can be used to improve the optical and physical properties of optical coatings.
- Coatings, Colorants and Finishes