Accession Number:

ADA169406

Title:

Stability of UV Optical Coatings in Hostile Excimer Laser Environments

Descriptive Note:

Final rept. Jul 1980-Dec 1985

Corporate Author:

WASHINGTON STATE UNIV PULLMAN DEPT OF PHYSICS

Personal Author(s):

Report Date:

1986-06-15

Pagination or Media Count:

106.0

Abstract:

Experiments simulating the exposure of optical coating materials to excimer laser environments are reported. Included are studies of the effect of ion bombardment on Si02 exposed to XeF2 the effect of electron bombardment on a Ag surface clean, or under thin films of ThF4, MgF2, Si02, or Al203 in the presence of XeF2 or F2 tghe effect of electron bombardment on ThF4 exposed to XeF2 and electron emission from F2 adsorption on tungsten, with a model for the F2 flux dependence and temperature dependence of this phenomenon. Keywords Optical coatings excimer laser laser damage reactive etching optical thin films mass spectroscopy mass loss surface reactions oxide films halide films tungsten chemisorption chemisorptive emission Fluorine and Xenon Fluoride.

Subject Categories:

  • Lasers and Masers
  • Fabrication Metallurgy
  • Optics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE