UV/Ozone Cleaning of Surfaces
Technical progress rept.
ARMY LAB COMMAND FORT MONMOUTH NJ ELECTRONICS TECHNOLOGY AND DEVICES LAB
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The UVozone methods, which is reviewed in this report, is an effective method of removing a variety of contaminants from surfaces. It is a simple-to-use dry process which is inexpensive to set up and operate. It can rapidly produce clean surfaces, in air or in a vacuum system, at ambient temperatures. Placing properly precleaned surface within a few millimeters of an ozone-producing UV source can produce clean surfaces in less than one minute. The technique can produce clean surfaces in less than one minute. The technique can produce near-atomically clean surfaces, as evidenced by Auger electron spectrosocpy AES, electron spectroscopy for chemical analysis ESCA, and ion scattering specroscopysecondary ion mass spectroscopy ISSSIMS studies. Topics discussed include the variables of the process, the types for surfaces which have been cleaned successfully, the contaminants that can be removed, the construction of a UV ozone cleaning facility, the mechanism of the process, UV ozone cleaning in vacuum systems, rate-enhancement techniques, safety consideration, effects of UVozone other than cleaning, and applications.
- Test Facilities, Equipment and Methods