Semiconducting Transition Metal Silicides for Electro-Optic VSLI Interconnects.
Interim status rept. no. 1,
COLORADO RESEARCH DEVELOPMENT CORP FORT COLLINS
Pagination or Media Count:
Since the start of the project on September 15, 1985, we have fabricated and partially characterized the CrSi2 thin films, and made preparations for improved optical measurement and for investigating the two other proposed materials, MnSi1.7 and IrSi1.75. These are detailed Chromium Silicide Formation, X-ray Diffraction Analysis of the Films, Resistivity Measurements, Optical Measurements and Preparations for MnSi1.7 and IrSi1.7r.
- Electrical and Electronic Equipment
- Solid State Physics