Accession Number:

ADA162548

Title:

Theoretical Investigations of the CVD (Chemical Vapor Deposition) of Silicon from Silane.

Descriptive Note:

Final rept. 1 Sep 82-31 Aug 85,

Corporate Author:

OKLAHOMA STATE UNIV STILLWATER DEPT OF CHEMISTRY

Personal Author(s):

Report Date:

1985-08-31

Pagination or Media Count:

20.0

Abstract:

The results of a program of theoretical research to determine the relative importance and dynamics of various elementary processes occurring in the chemical vapor deposition CVD of silicon from silane are reported. The processes studied include the gas-phase unimolecular dissociation of SiH4, Ch4, and SiH2, the homogeneous three-body recombination of Si atoms, surface adsorption and diffusion of Si atoms on Si100 and Si111 surfaces, and the recombination and desorption of H2 on silicon surfaces. In addition, several studies involving the reaction dynamics of van der Waals molecules are described. We also report the development of a quantum mechanical method for computing the results of elastic and inelastic atomic scattering from surfaces. Author

Subject Categories:

  • Atomic and Molecular Physics and Spectroscopy

Distribution Statement:

APPROVED FOR PUBLIC RELEASE