Accession Number:

ADA162346

Title:

Laser Evaporation Studies.

Descriptive Note:

Rept. no. 1 (Annual) 1 Sep 84-30 Jun 85,

Corporate Author:

ROCKWELL INTERNATIONAL THOUSAND OAKS CA SCIENCE CENTER

Personal Author(s):

Report Date:

1985-07-01

Pagination or Media Count:

41.0

Abstract:

The use of a pulsed laser to evaporate dielectric materials for optical thin film deposition was investigated. Studies were performed to analyze the species present in the evaporant plume generated by a 1.5 Joule TEA-CO2 laser. the materials investigated were Al203, Si02, Zn0, PbF2, Ti02, and Hf02. Experiments were performed in a cryopumped system with a base pressure of 10 to the 8th power torr. The evaporant plume was characterized using luminescence spectroscopy, mass spectroscopy, and ion current analysis. Luminescence studies indicated the existence of excited state neutrals and singly, doubly and triply ionized species. Plasma electron temperatures of 6500 K were deduced from a study of neutrals in the plumes of Si02 and Al203. Molecular species were found in significant concentrations only for higher .001 torr residual gas pressures. Ion current analysis demonstrated the existence of several species for each compound, each with different velocities. Velocities of 15 million cmsec indicated very high kinetic energies for the ionized species. In the following phase of the program, the effects of excited state and energetic species on thin film growth will be investigated. Keywords Luminescence Ambient Gas Power dependence Mass spectroscopy Dielectric materials.

Subject Categories:

  • Lasers and Masers
  • Atomic and Molecular Physics and Spectroscopy
  • Optics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE