Accession Number:

ADA151379

Title:

In Situ Thin Film Measurements.

Descriptive Note:

Final rept. 15 Oct 83-15 Oct 84,

Corporate Author:

ARIZONA UNIV TUCSON OPTICAL SCIENCES CENTER

Personal Author(s):

• Pelletier,E.
• MacLeod,H. A.

Report Date:

1984-12-15

Pagination or Media Count:

69.0

Abstract:

The optical properties of vacuum-deposited thin films were studied in situ during deposition and in air after deposition at the Ecole Nationale Superieure de Physique, Marseille, and at the Optical Sciences Center, University of Arizona, with the objective of a better understanding of aspects of their behaviour determined largely by their microstructure. The basic measurements that were made in both institutes were similar, T and R after deposition and T during deposition, both as functions of wavelength in the visible and near infrared. The techniques for reducing the measurements to values of n, k and of inhomogeneity differed in certain respects but the results were similar. The scientific objectives were a The measurement of the optical constants of thin-films in air after deposition. b The measurement of the optical constants of thin films in situ. c The study of the differences in the measurements under a and b. d The study of aspects of the thin-film deposition process affecting the film performance as measured under a and b. e The measurement of optical scattering from thin films and its relation with film structure.

Descriptors:

• *OPTICAL PROPERTIES
• *THIN FILMS
• FREQUENCY
• LIGHT SCATTERING
• MEASUREMENT
• MICROSTRUCTURE
• CONSTANTS
• VISIBLE SPECTRA
• NEAR INFRARED RADIATION
• VACUUM DEPOSITION
• HOMOGENEITY

Subject Categories:

• Optics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE