Accession Number:

ADA149855

Title:

Growth of Amorphous Ti2O3 Layers by Laser-Induced Oxidation.

Descriptive Note:

Corporate Author:

MICHIGAN UNIV ANN ARBOR DEPT OF PHYSICS

Personal Author(s):

Report Date:

1984-10-15

Pagination or Media Count:

3.0

Abstract:

Amorphous Ti2O3 films with thicknesses approx. greater than 1000 A have been obtained by cw laser irradiation of Ti50Zr10Be40 exposed to low oxygen pressures. In contrast, thermal oxidation of nonirradiated samples reveals scales composed of crystalline oxides. Raman scattering, x-ray, and electron microscopy data on the layers are reported. It is suggested that irradiation leads to an enhanced oxidation rate preventing crystallization. Possible mechanisms of enhancement are discussed. Originator-supplied key words include Oxidation Thin films Titanium oxides Oxides Preventing crystallization Thermal oxidation Amorphous materials.

Subject Categories:

  • Physical Chemistry
  • Solid State Physics

Distribution Statement:

APPROVED FOR PUBLIC RELEASE