Growth of Amorphous Ti2O3 Layers by Laser-Induced Oxidation.
MICHIGAN UNIV ANN ARBOR DEPT OF PHYSICS
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Amorphous Ti2O3 films with thicknesses approx. greater than 1000 A have been obtained by cw laser irradiation of Ti50Zr10Be40 exposed to low oxygen pressures. In contrast, thermal oxidation of nonirradiated samples reveals scales composed of crystalline oxides. Raman scattering, x-ray, and electron microscopy data on the layers are reported. It is suggested that irradiation leads to an enhanced oxidation rate preventing crystallization. Possible mechanisms of enhancement are discussed. Originator-supplied key words include Oxidation Thin films Titanium oxides Oxides Preventing crystallization Thermal oxidation Amorphous materials.
- Physical Chemistry
- Solid State Physics